MUNICH & GARCHING, GERMANY: SUSS MicroTec has launched the MO Exposure Optics, a new illumination system designed for all generations of manual and automatic SUSS mask aligners.

The new optical system is based on unique microlens arrays of high optical quality to provide higher intensity, improved exposure light uniformity and customized illumination shaping. This allows users of SUSS MicroTec mask aligners to optimize the process window and enhance yield in contact and proximity lithography. MO Exposure Optics (patent pending) has been exclusively developed by SUSS MicroOptics, a world leading supplier for high-quality optic solutions in illumination, laser beam shaping, metrology, medical and vision systems.

MO Exposure Optics is provided with a library of illumination settings, including all established SUSS MicroTec mask aligner settings (A-Optics, D-Optics, LGO and HR) plus additional settings like ring illumination, dipole, quadrupole, multipole and maltese cross.

By a simple change of the Illumination Filter Plates (IFP) the user can choose the optimized illumination settings to achieve a higher process latitude. Automated IFP exchanger will be offered for production mask aligners.

A free choice of optimized illumination settings, e.g. ring illumination for vias and maltese cross for vertical and horizontal lines will increase the depth of focus and exposure latitude while reducing mask error factors. The system also allows users to design fully made-to-order illumination that optimizes their layer-specific process windows.